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Engineering individual grain boundaries using a zone-confining process in chemical vapor deposited Cu films
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10.1063/1.120043
/content/aip/journal/apl/71/16/10.1063/1.120043
http://aip.metastore.ingenta.com/content/aip/journal/apl/71/16/10.1063/1.120043
/content/aip/journal/apl/71/16/10.1063/1.120043
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/content/aip/journal/apl/71/16/10.1063/1.120043
1997-10-20
2014-09-16
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Engineering individual grain boundaries using a zone-confining process in chemical vapor deposited Cu films
http://aip.metastore.ingenta.com/content/aip/journal/apl/71/16/10.1063/1.120043
10.1063/1.120043
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