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Preservation of atomic flatness at interfaces during thermal oxidation in a furnace
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10.1063/1.121161
/content/aip/journal/apl/72/14/10.1063/1.121161
http://aip.metastore.ingenta.com/content/aip/journal/apl/72/14/10.1063/1.121161
/content/aip/journal/apl/72/14/10.1063/1.121161
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/content/aip/journal/apl/72/14/10.1063/1.121161
1998-04-06
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Preservation of atomic flatness at SiO2/Si(111) interfaces during thermal oxidation in a furnace
http://aip.metastore.ingenta.com/content/aip/journal/apl/72/14/10.1063/1.121161
10.1063/1.121161
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