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Changes in structure and nature of defects by annealing of fluorinated amorphous carbon thin films with low dielectric constant
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10.1063/1.121105
/content/aip/journal/apl/72/21/10.1063/1.121105
http://aip.metastore.ingenta.com/content/aip/journal/apl/72/21/10.1063/1.121105
/content/aip/journal/apl/72/21/10.1063/1.121105
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/content/aip/journal/apl/72/21/10.1063/1.121105
1998-05-25
2014-12-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Changes in structure and nature of defects by annealing of fluorinated amorphous carbon thin films with low dielectric constant
http://aip.metastore.ingenta.com/content/aip/journal/apl/72/21/10.1063/1.121105
10.1063/1.121105
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