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Improvement of Ta diffusion barrier performance in Cu metallization by insertion of a thin Zr layer into Ta film
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10.1063/1.121472
/content/aip/journal/apl/72/22/10.1063/1.121472
http://aip.metastore.ingenta.com/content/aip/journal/apl/72/22/10.1063/1.121472
/content/aip/journal/apl/72/22/10.1063/1.121472
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/content/aip/journal/apl/72/22/10.1063/1.121472
1998-06-01
2014-07-10
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Improvement of Ta diffusion barrier performance in Cu metallization by insertion of a thin Zr layer into Ta film
http://aip.metastore.ingenta.com/content/aip/journal/apl/72/22/10.1063/1.121472
10.1063/1.121472
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