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Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors
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10.1063/1.121717
/content/aip/journal/apl/73/1/10.1063/1.121717
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/1/10.1063/1.121717
/content/aip/journal/apl/73/1/10.1063/1.121717
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/content/aip/journal/apl/73/1/10.1063/1.121717
1998-07-06
2014-08-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress evolution in Mo/Si multilayers for high-reflectivity extreme ultraviolet mirrors
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/1/10.1063/1.121717
10.1063/1.121717
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