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Formation of CoTi barrier and increased thermal stability of film in Ti capped Co/Si(100) system
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10.1063/1.121804
/content/aip/journal/apl/73/16/10.1063/1.121804
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/16/10.1063/1.121804
/content/aip/journal/apl/73/16/10.1063/1.121804
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/content/aip/journal/apl/73/16/10.1063/1.121804
1998-10-19
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Formation of CoTi barrier and increased thermal stability of CoSi2 film in Ti capped Co/Si(100) system
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/16/10.1063/1.121804
10.1063/1.121804
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