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Atomically defined epitaxy and physical properties of strained films
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10.1063/1.122494
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    Affiliations:
    1 Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-0046, Japan
    2 Surface Analysis and Semiconductor Equipment Department Shimadzu Corp., Horiyamashita, Hadano 259-1304, Japan
    3 Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-0046, Japan
    4 Department of Innovative and Engineered Materials, Tokyo Institute of Technology, Yokohmama 226-8502, Japan
    5 Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-0046, Japan
    6 Department of Applied Physics, The University of Tokyo, Tokyo, 113-8656, Japan
    Appl. Phys. Lett. 73, 2497 (1998); http://dx.doi.org/10.1063/1.122494
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/content/aip/journal/apl/73/17/10.1063/1.122494
1998-10-26
2014-11-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Atomically defined epitaxy and physical properties of strained La0.6Sr0.4MnO3 films
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/17/10.1063/1.122494
10.1063/1.122494
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