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Direct micropatterning of Si and GaAs using electrochemical development of focused ion beam implants
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10.1063/1.122518
/content/aip/journal/apl/73/18/10.1063/1.122518
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/18/10.1063/1.122518
/content/aip/journal/apl/73/18/10.1063/1.122518
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/content/aip/journal/apl/73/18/10.1063/1.122518
1998-11-02
2014-09-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Direct micropatterning of Si and GaAs using electrochemical development of focused ion beam implants
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/18/10.1063/1.122518
10.1063/1.122518
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