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Mechanism of low temperature C54 formation bypassing C49 Effect of Si microstructure and Mo impurities on the Ti–Si reaction path
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10.1063/1.122032
/content/aip/journal/apl/73/7/10.1063/1.122032
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/7/10.1063/1.122032
/content/aip/journal/apl/73/7/10.1063/1.122032
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/content/aip/journal/apl/73/7/10.1063/1.122032
1998-08-17
2014-12-27
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanism of low temperature C54 TiSi2 formation bypassing C49 TiSi2: Effect of Si microstructure and Mo impurities on the Ti–Si reaction path
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/7/10.1063/1.122032
10.1063/1.122032
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