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Reentrant metal–insulator-type transition induced by high fluence chromium ion implantation of thin films
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10.1063/1.122067
/content/aip/journal/apl/73/7/10.1063/1.122067
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/7/10.1063/1.122067
/content/aip/journal/apl/73/7/10.1063/1.122067
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/content/aip/journal/apl/73/7/10.1063/1.122067
1998-08-17
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reentrant metal–insulator-type transition induced by high fluence chromium ion implantation of La0.7Ca0.3MnO3 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/73/7/10.1063/1.122067
10.1063/1.122067
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