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Surface conditioning of chemical vapor deposited hexagonal boron nitride film for negative electron affinity
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10.1063/1.123122
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    Affiliations:
    1 Core Research for Evolutional Science and Technology (CREST) of Japan Science and Technology Corporation (JST), c/o National Institute for Research in Inorganic Materials (NIRIM), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
    2 Department of Electrical Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
    3 Core Research for Evolutional Science and Technology (CREST) of Japan Science and Technology Corporation (JST) and National Institute for Research in Inorganic Materials (NIRIM), 1-1 Namiki, Tsukuba, Ibaraki 305-0044, Japan
    Appl. Phys. Lett. 74, 28 (1999); http://dx.doi.org/10.1063/1.123122
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/content/aip/journal/apl/74/1/10.1063/1.123122
1999-01-04
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface conditioning of chemical vapor deposited hexagonal boron nitride film for negative electron affinity
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/1/10.1063/1.123122
10.1063/1.123122
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