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Kinetics of nickel-induced lateral crystallization of amorphous silicon thin-film transistors by rapid thermal and furnace anneals
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10.1063/1.123695
/content/aip/journal/apl/74/13/10.1063/1.123695
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/13/10.1063/1.123695
/content/aip/journal/apl/74/13/10.1063/1.123695
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/content/aip/journal/apl/74/13/10.1063/1.123695
1999-03-29
2014-10-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Kinetics of nickel-induced lateral crystallization of amorphous silicon thin-film transistors by rapid thermal and furnace anneals
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/13/10.1063/1.123695
10.1063/1.123695
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