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Suppressed diffusion of implanted boron in 4H–SiC
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10.1063/1.123828
/content/aip/journal/apl/74/16/10.1063/1.123828
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/16/10.1063/1.123828
/content/aip/journal/apl/74/16/10.1063/1.123828
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/content/aip/journal/apl/74/16/10.1063/1.123828
1999-04-19
2014-09-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Suppressed diffusion of implanted boron in 4H–SiC
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/16/10.1063/1.123828
10.1063/1.123828
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