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Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
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10.1063/1.123832
/content/aip/journal/apl/74/16/10.1063/1.123832
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/16/10.1063/1.123832
/content/aip/journal/apl/74/16/10.1063/1.123832
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/content/aip/journal/apl/74/16/10.1063/1.123832
1999-04-19
2014-07-29
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/16/10.1063/1.123832
10.1063/1.123832
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