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The effect of topographic interface roughness on the leakage current of thin films
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10.1063/1.124018
/content/aip/journal/apl/74/19/10.1063/1.124018
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/19/10.1063/1.124018
/content/aip/journal/apl/74/19/10.1063/1.124018
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/content/aip/journal/apl/74/19/10.1063/1.124018
1999-05-10
2014-07-13
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: The effect of Al–Ta2O5 topographic interface roughness on the leakage current of Ta2O5 thin films
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/19/10.1063/1.124018
10.1063/1.124018
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