1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Mechanism of enhanced formation of in high-temperature deposited Ti thin films on preamorphized (001)Si
Rent:
Rent this article for
USD
10.1063/1.123300
/content/aip/journal/apl/74/2/10.1063/1.123300
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/2/10.1063/1.123300
/content/aip/journal/apl/74/2/10.1063/1.123300
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/74/2/10.1063/1.123300
1999-01-11
2014-08-21
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Mechanism of enhanced formation of C54–TiSi2 in high-temperature deposited Ti thin films on preamorphized (001)Si
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/2/10.1063/1.123300
10.1063/1.123300
SEARCH_EXPAND_ITEM