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Analysis of the potential distribution in the channel region of a platinum silicided source/drain metal oxide semiconductor field effect transistor
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10.1063/1.123360
/content/aip/journal/apl/74/22/10.1063/1.123360
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/22/10.1063/1.123360
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/content/aip/journal/apl/74/22/10.1063/1.123360
1999-05-31
2014-04-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Analysis of the potential distribution in the channel region of a platinum silicided source/drain metal oxide semiconductor field effect transistor
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/22/10.1063/1.123360
10.1063/1.123360
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