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Clustering of ultra-low-energy implanted boron in silicon during postimplantation annealing
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10.1063/1.123239
/content/aip/journal/apl/74/26/10.1063/1.123239
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/26/10.1063/1.123239
/content/aip/journal/apl/74/26/10.1063/1.123239
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/content/aip/journal/apl/74/26/10.1063/1.123239
1999-06-28
2014-12-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Clustering of ultra-low-energy implanted boron in silicon during postimplantation annealing
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/26/10.1063/1.123239
10.1063/1.123239
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