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Ultrathin silicon oxynitride film formation by plasma immersion nitrogen implantation
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10.1063/1.123374
/content/aip/journal/apl/74/6/10.1063/1.123374
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/6/10.1063/1.123374
/content/aip/journal/apl/74/6/10.1063/1.123374
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/content/aip/journal/apl/74/6/10.1063/1.123374
1999-02-08
2014-09-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Ultrathin silicon oxynitride film formation by plasma immersion nitrogen implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/6/10.1063/1.123374
10.1063/1.123374
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