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Comparison of ultralow-energy ion implantation of boron and for ultrashallow junction formation
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10.1063/1.123514
/content/aip/journal/apl/74/9/10.1063/1.123514
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/9/10.1063/1.123514
/content/aip/journal/apl/74/9/10.1063/1.123514
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/content/aip/journal/apl/74/9/10.1063/1.123514
1999-03-01
2014-10-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of ultralow-energy ion implantation of boron and BF2 for ultrashallow p+/n junction formation
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/9/10.1063/1.123514
10.1063/1.123514
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