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Oxidation of Si beneath thin layers during exposure to plasmas, investigated by vacuum transfer x-ray photoelectron spectroscopy
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10.1063/1.123518
/content/aip/journal/apl/74/9/10.1063/1.123518
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/9/10.1063/1.123518
/content/aip/journal/apl/74/9/10.1063/1.123518
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/content/aip/journal/apl/74/9/10.1063/1.123518
1999-03-01
2014-07-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Oxidation of Si beneath thin SiO2 layers during exposure to HBr/O2 plasmas, investigated by vacuum transfer x-ray photoelectron spectroscopy
http://aip.metastore.ingenta.com/content/aip/journal/apl/74/9/10.1063/1.123518
10.1063/1.123518
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