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Metal–organic atomic-layer deposition of titanium–silicon–nitride films
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10.1063/1.124742
/content/aip/journal/apl/75/11/10.1063/1.124742
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/11/10.1063/1.124742
/content/aip/journal/apl/75/11/10.1063/1.124742
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/content/aip/journal/apl/75/11/10.1063/1.124742
1999-09-13
2014-08-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Metal–organic atomic-layer deposition of titanium–silicon–nitride films
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/11/10.1063/1.124742
10.1063/1.124742
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