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Boron retarded self-interstitial diffusion in Czochralski growth of silicon crystals and its role in oxidation-induced stacking-fault ring dynamics
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10.1063/1.124749
/content/aip/journal/apl/75/11/10.1063/1.124749
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/11/10.1063/1.124749
/content/aip/journal/apl/75/11/10.1063/1.124749
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/content/aip/journal/apl/75/11/10.1063/1.124749
1999-09-13
2014-09-03
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Boron retarded self-interstitial diffusion in Czochralski growth of silicon crystals and its role in oxidation-induced stacking-fault ring dynamics
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/11/10.1063/1.124749
10.1063/1.124749
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