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Evolution of residual stress in plasma-enhanced chemical-vapor-deposited silicon dioxide film exposed to room air
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10.1063/1.125464
/content/aip/journal/apl/75/24/10.1063/1.125464
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/24/10.1063/1.125464
/content/aip/journal/apl/75/24/10.1063/1.125464
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/content/aip/journal/apl/75/24/10.1063/1.125464
1999-12-13
2014-09-15
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Evolution of residual stress in plasma-enhanced chemical-vapor-deposited silicon dioxide film exposed to room air
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/24/10.1063/1.125464
10.1063/1.125464
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