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Hydrogen blister depth in boron and hydrogen coimplanted n-type silicon
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10.1063/1.125500
/content/aip/journal/apl/75/25/10.1063/1.125500
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/25/10.1063/1.125500
/content/aip/journal/apl/75/25/10.1063/1.125500
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/content/aip/journal/apl/75/25/10.1063/1.125500
1999-12-20
2014-11-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Hydrogen blister depth in boron and hydrogen coimplanted n-type silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/25/10.1063/1.125500
10.1063/1.125500
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