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Sensitization of emission at 1.5 μm in thermally grown on silicon by coimplantation of Yb
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10.1063/1.124515
/content/aip/journal/apl/75/6/10.1063/1.124515
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/6/10.1063/1.124515
/content/aip/journal/apl/75/6/10.1063/1.124515
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/content/aip/journal/apl/75/6/10.1063/1.124515
1999-08-09
2014-12-25
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Sensitization of Er3+ emission at 1.5 μm in SiO2 thermally grown on silicon by coimplantation of Yb
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/6/10.1063/1.124515
10.1063/1.124515
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