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Analysis of the improved contact resistance in metal- silicon Schottky barriers using the mixed implantation
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10.1063/1.124669
/content/aip/journal/apl/75/9/10.1063/1.124669
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/9/10.1063/1.124669
/content/aip/journal/apl/75/9/10.1063/1.124669
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/content/aip/journal/apl/75/9/10.1063/1.124669
1999-08-30
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Analysis of the improved contact resistance in metal-p+ silicon Schottky barriers using the BF2/B mixed implantation
http://aip.metastore.ingenta.com/content/aip/journal/apl/75/9/10.1063/1.124669
10.1063/1.124669
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