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In situ transmission electron microscopy observation of thin solid aluminum film thermal flow into submicron-sized periodic grooves fabricated on a silicon oxide substrate
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10.1063/1.125899
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    Affiliations:
    1 Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, Yamadaoka, Suita, Osaka 565-0871, Japan
    2 National Research Institute for Metals, Sakura, Tsukuba, Ibaraki 305-0003, Japan
    3 ULSI Research Laboratories, Research and Development Center, Toshiba Corporation, 1, Komukai-Toshiba-Cho, Saiwai-Ku, Kawasaki, Kanagawa 212-0001, Japan
    4 National Research Institute for Metals, Sakura, Tsukuba, Ibaraki 305-0003, Japan
    Appl. Phys. Lett. 76, 1270 (2000); http://dx.doi.org/10.1063/1.125899
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/content/aip/journal/apl/76/10/10.1063/1.125899
2000-03-06
2014-08-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: In situ transmission electron microscopy observation of thin solid aluminum film thermal flow into submicron-sized periodic grooves fabricated on a silicon oxide substrate
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/10/10.1063/1.125899
10.1063/1.125899
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