1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
Features of hydrogenated amorphous silicon films developed under an unexplored region of parameter space of radio-frequency plasma-enhanced chemical vapor deposition
Rent:
Rent this article for
USD
10.1063/1.126339
    + View Affiliations - Hide Affiliations
    Affiliations:
    1 Energy Research Unit, Indian Association for the Cultivation of Science, Jadavpur, Calcutta-700 032, India
    2 Laboratoire de Génie Electrique de Paris, Ecole Supérieure d’Electricité, Universités Paris VI et Paris XI, Plateau de Moulon, 91192 Gif-Sur-Yvette Cedex, France
    3 Energy Research Unit, Indian Association for the Cultivation of Science, Jadavpur, Calcutta-700 032, India
    Appl. Phys. Lett. 76, 2340 (2000); http://dx.doi.org/10.1063/1.126339
/content/aip/journal/apl/76/17/10.1063/1.126339
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/17/10.1063/1.126339
/content/aip/journal/apl/76/17/10.1063/1.126339
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/76/17/10.1063/1.126339
2000-04-24
2014-07-30
Loading

Full text loading...

This is a required field
Please enter a valid email address
This feature is disabled while Scitation upgrades its access control system.
This feature is disabled while Scitation upgrades its access control system.
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Features of hydrogenated amorphous silicon films developed under an unexplored region of parameter space of radio-frequency plasma-enhanced chemical vapor deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/17/10.1063/1.126339
10.1063/1.126339
SEARCH_EXPAND_ITEM