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Enhanced damage due to light in low-damage reactive-ion etching processes
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10.1063/1.126501
/content/aip/journal/apl/76/20/10.1063/1.126501
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/20/10.1063/1.126501
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/content/aip/journal/apl/76/20/10.1063/1.126501
2000-05-15
2014-04-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Enhanced damage due to light in low-damage reactive-ion etching processes
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/20/10.1063/1.126501
10.1063/1.126501
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