1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Resistless pattern definition and Si selective-area deposition using an ultrathin mask layer treated by
Rent:
Rent this article for
USD
10.1063/1.126629
/content/aip/journal/apl/76/22/10.1063/1.126629
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/22/10.1063/1.126629
/content/aip/journal/apl/76/22/10.1063/1.126629
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/76/22/10.1063/1.126629
2000-05-29
2014-12-26
Loading

Full text loading...

This is a required field
Please enter a valid email address
752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Resistless pattern definition and Si selective-area deposition using an ultrathin SiO2 mask layer treated by SiHCl3
http://aip.metastore.ingenta.com/content/aip/journal/apl/76/22/10.1063/1.126629
10.1063/1.126629
SEARCH_EXPAND_ITEM