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Roughness evolution in polyimide films during plasma etching
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10.1063/1.1364507
/content/aip/journal/apl/78/16/10.1063/1.1364507
http://aip.metastore.ingenta.com/content/aip/journal/apl/78/16/10.1063/1.1364507
/content/aip/journal/apl/78/16/10.1063/1.1364507
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/content/aip/journal/apl/78/16/10.1063/1.1364507
2001-04-16
2014-08-31
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Roughness evolution in polyimide films during plasma etching
http://aip.metastore.ingenta.com/content/aip/journal/apl/78/16/10.1063/1.1364507
10.1063/1.1364507
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