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Generic degradation mechanism for 980 nm strained quantum-well lasers
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10.1063/1.1371967
/content/aip/journal/apl/78/21/10.1063/1.1371967
http://aip.metastore.ingenta.com/content/aip/journal/apl/78/21/10.1063/1.1371967
/content/aip/journal/apl/78/21/10.1063/1.1371967
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/content/aip/journal/apl/78/21/10.1063/1.1371967
2001-05-21
2014-09-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Generic degradation mechanism for 980 nm InxGa1−xAs/GaAs strained quantum-well lasers
http://aip.metastore.ingenta.com/content/aip/journal/apl/78/21/10.1063/1.1371967
10.1063/1.1371967
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