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Reduction of microtrenching and island formation in oxide plasma etching by employing electron beam charge neutralization
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10.1063/1.1413726
/content/aip/journal/apl/79/17/10.1063/1.1413726
http://aip.metastore.ingenta.com/content/aip/journal/apl/79/17/10.1063/1.1413726
/content/aip/journal/apl/79/17/10.1063/1.1413726
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/content/aip/journal/apl/79/17/10.1063/1.1413726
2001-10-22
2014-10-22
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Reduction of microtrenching and island formation in oxide plasma etching by employing electron beam charge neutralization
http://aip.metastore.ingenta.com/content/aip/journal/apl/79/17/10.1063/1.1413726
10.1063/1.1413726
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