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Measurement of interstitial oxygen concentration in silicon below
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10.1063/1.1429293
/content/aip/journal/apl/79/26/10.1063/1.1429293
http://aip.metastore.ingenta.com/content/aip/journal/apl/79/26/10.1063/1.1429293
/content/aip/journal/apl/79/26/10.1063/1.1429293
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/content/aip/journal/apl/79/26/10.1063/1.1429293
2001-12-24
2014-12-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Measurement of interstitial oxygen concentration in silicon below 1015 atoms/cm3
http://aip.metastore.ingenta.com/content/aip/journal/apl/79/26/10.1063/1.1429293
10.1063/1.1429293
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