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Ultralow- dielectrics prepared by plasma-enhanced chemical vapor deposition
1.M. McCoy, 2000C&EN, 17 (November 2000).
2.L. Peters, Semicond. Int. 23, 108 (2000).
3.A. Grill, L. Perraud, V. Patel, C. Jahnes, and S. Cohen, Mater. Res. Soc. Symp. Proc. 565, 107 (1999).
4.G. Y. Lee, D. C. Edelstein, R. Conti, W. Cote, K.-S. Low, D. Dobuzinsky, G. Feng, K. Dev, P. Wrschka, P. Shafer, R. Ramachandran, A. Simpson, E. Liniger, E. Simonyi, T. Dalton, T. Spooner, C. Jahnes, E. Kaltalioglu, and A. Grill, Advanced Metallization Conference, San Diego, CA, 3–5 October 2000.
5.A. Grill and V. Patel, Mater. Res. Soc. Symp. Proc. 612, D2.9 (2000).
6.C. Jin and J. Wetzel, Proceedings of the IEEE 2000 International Interconnect Technology Conference, Burlingame, CA, June 5–7, 2000.
7.Y. Y. Cheng, L. C. Chao, S. M. Jang, C. H. Yu, and M. S. Liang, Proceedings of the IEEE 2000 International Interconnect Technology Conference, Burlingame, CA, June 5–7, 2000.
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