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Erratum: “Epitaxial growth of orientation‐controlled crystal films on MgO using intermediate layer by metalorganic chemical vapor deposition” [Appl. Phys. Lett. 78, 49 (2001)]
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/content/aip/journal/apl/79/8/10.1063/1.1396621
2001-08-20
2014-07-24
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Erratum: “Epitaxial growth of orientation‐controlled KNbO3 crystal films on MgO using KTaxNb1−xO3 intermediate layer by metalorganic chemical vapor deposition” [Appl. Phys. Lett. 78, 49 (2001)]
http://aip.metastore.ingenta.com/content/aip/journal/apl/79/8/10.1063/1.1396621
10.1063/1.1396621
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