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Comparison of arsenic and phosphorus diffusion behavior in silicon–germanium alloys
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10.1063/1.1458047
/content/aip/journal/apl/80/10/10.1063/1.1458047
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/10/10.1063/1.1458047
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/content/aip/journal/apl/80/10/10.1063/1.1458047
2002-03-11
2014-04-19
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Comparison of arsenic and phosphorus diffusion behavior in silicon–germanium alloys
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/10/10.1063/1.1458047
10.1063/1.1458047
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