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Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition
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10.1063/1.1473237
/content/aip/journal/apl/80/18/10.1063/1.1473237
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/18/10.1063/1.1473237
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/content/aip/journal/apl/80/18/10.1063/1.1473237
2002-04-29
2014-04-17
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/18/10.1063/1.1473237
10.1063/1.1473237
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