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Stress as a governing parameter to control the crystallization of amorphous silicon films by thermal annealing
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10.1063/1.1482795
/content/aip/journal/apl/80/22/10.1063/1.1482795
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/22/10.1063/1.1482795
/content/aip/journal/apl/80/22/10.1063/1.1482795
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/content/aip/journal/apl/80/22/10.1063/1.1482795
2002-05-23
2014-12-20
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Stress as a governing parameter to control the crystallization of amorphous silicon films by thermal annealing
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/22/10.1063/1.1482795
10.1063/1.1482795
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