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Orientation-controlled epitaxy and anisotropic properties of with covering the insulator–metal transition
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10.1063/1.1436523
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    Affiliations:
    1 Department of Applied Physics, University of Tokyo, Tokyo 113-8656, Japan
    2 Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-0046, Japan
    3 Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-0046, Japan
    4 Correlated Electron Research Center (CERC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8562, Japan
    5 Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
    6 Joint Research Center for Atom Technology (JRCAT), Tsukuba 305-0046, Japan
    7 Correlated Electron Research Center (CERC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8562, Japan
    8 Department of Applied Physics, University of Tokyo, Tokyo 113-8656, Japan
    Appl. Phys. Lett. 80, 574 (2002); http://dx.doi.org/10.1063/1.1436523
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/content/aip/journal/apl/80/4/10.1063/1.1436523
2002-01-28
2014-08-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Orientation-controlled epitaxy and anisotropic properties of La2−xSrxNiO4 with 0.5⩽x⩽1.5 covering the insulator–metal transition
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/4/10.1063/1.1436523
10.1063/1.1436523
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