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Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography
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10.1063/1.1436275
/content/aip/journal/apl/80/5/10.1063/1.1436275
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/5/10.1063/1.1436275
/content/aip/journal/apl/80/5/10.1063/1.1436275
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/content/aip/journal/apl/80/5/10.1063/1.1436275
2002-02-04
2014-07-12
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/5/10.1063/1.1436275
10.1063/1.1436275
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