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Simple expression for vacancy concentrations at half ion range following MeV ion implantation of silicon
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10.1063/1.1448856
/content/aip/journal/apl/80/6/10.1063/1.1448856
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/6/10.1063/1.1448856
/content/aip/journal/apl/80/6/10.1063/1.1448856
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/content/aip/journal/apl/80/6/10.1063/1.1448856
2002-02-11
2014-09-23
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Simple expression for vacancy concentrations at half ion range following MeV ion implantation of silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/6/10.1063/1.1448856
10.1063/1.1448856
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