1887
banner image
No data available.
Please log in to see this content.
You have no subscription access to this content.
No metrics data to plot.
The attempt to load metrics for this article has failed.
The attempt to plot a graph for these metrics has failed.
The full text of this article is not currently available.
Simple expression for vacancy concentrations at half ion range following MeV ion implantation of silicon
Rent:
Rent this article for
USD
10.1063/1.1448856
/content/aip/journal/apl/80/6/10.1063/1.1448856
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/6/10.1063/1.1448856
/content/aip/journal/apl/80/6/10.1063/1.1448856
Loading

Data & Media loading...

Loading

Article metrics loading...

/content/aip/journal/apl/80/6/10.1063/1.1448856
2002-02-11
2015-07-31
Loading

Full text loading...

This is a required field
Please enter a valid email address

Oops! This section does not exist...

Use the links on this page to find existing content.

752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Simple expression for vacancy concentrations at half ion range following MeV ion implantation of silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/80/6/10.1063/1.1448856
10.1063/1.1448856
SEARCH_EXPAND_ITEM