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Dependence of physical properties and giant magnetoresistance ratio on substrate position during rf sputtering of NiO and for bottom spin valves
1.D. Wai and H. N. Bertram, IEEE Trans. Magn. 32, 3434 (1996).
2.H. S. Joo and H. A. Atwater, IEEE Trans. Magn. 31, 3946 (1995).
3.T. Namikawa, K. Keneta, N. Matsushita, S. Nakagawa, and M. Naoe, IEEE Trans. Magn. 35, 2850 (1999).
4.W. E. Baily, N. C. Zhu, R. Sinclair, and S. X. Wang, IEEE Trans. Magn. 34, 957 (1998).
5.J. C. S. Kools, J. Appl. Phys. 77, 2993 (1995).
6.S. Abe, A. Matsushita, K. Negishi, Y. Beba, and M. Naoe, IEEE Trans. Magn. 35, 3634 (1999).
7.S. Bae, W. F. Egelhoff, P. J. Chen, and J. H. Judy, IEEE Trans. Magn. 36, 2892 (2000).
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