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X-ray diffuse scattering study of the kinetics of stacking fault growth and annihilation in boron-implanted silicon
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10.1063/1.1516239
/content/aip/journal/apl/81/17/10.1063/1.1516239
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/17/10.1063/1.1516239
/content/aip/journal/apl/81/17/10.1063/1.1516239
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/content/aip/journal/apl/81/17/10.1063/1.1516239
2002-10-15
2014-09-18
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: X-ray diffuse scattering study of the kinetics of stacking fault growth and annihilation in boron-implanted silicon
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/17/10.1063/1.1516239
10.1063/1.1516239
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