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Thermal stability of atomic-layer-deposited thin films on the -passivated Si substrate
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10.1063/1.1520333
/content/aip/journal/apl/81/19/10.1063/1.1520333
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/19/10.1063/1.1520333
/content/aip/journal/apl/81/19/10.1063/1.1520333
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/content/aip/journal/apl/81/19/10.1063/1.1520333
2002-10-28
2014-09-21
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Thermal stability of atomic-layer-deposited HfO2 thin films on the SiNx-passivated Si substrate
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/19/10.1063/1.1520333
10.1063/1.1520333
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