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Effect of nitrogen at interface on reliability issues—negative-bias-temperature instability and Fowler–Nordheim-stress degradation
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10.1063/1.1526158
/content/aip/journal/apl/81/23/10.1063/1.1526158
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/23/10.1063/1.1526158
/content/aip/journal/apl/81/23/10.1063/1.1526158
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/content/aip/journal/apl/81/23/10.1063/1.1526158
2002-11-25
2014-07-30
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Effect of nitrogen at SiO2/Si interface on reliability issues—negative-bias-temperature instability and Fowler–Nordheim-stress degradation
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/23/10.1063/1.1526158
10.1063/1.1526158
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