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Surface passivation of n-type crystalline Si by plasma-enhanced-chemical-vapor-deposited amorphous and amorphous films
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10.1063/1.1527230
/content/aip/journal/apl/81/23/10.1063/1.1527230
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/23/10.1063/1.1527230
/content/aip/journal/apl/81/23/10.1063/1.1527230
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/content/aip/journal/apl/81/23/10.1063/1.1527230
2002-11-25
2014-07-14
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Surface passivation of n-type crystalline Si by plasma-enhanced-chemical-vapor-deposited amorphous SiCx:H and amorphous SiCxNy:H films
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/23/10.1063/1.1527230
10.1063/1.1527230
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