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Characteristics of silicon nanocrystal floating gate memory using amorphous tunnel barrier
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10.1063/1.1533119
/content/aip/journal/apl/81/27/10.1063/1.1533119
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/27/10.1063/1.1533119
/content/aip/journal/apl/81/27/10.1063/1.1533119
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/content/aip/journal/apl/81/27/10.1063/1.1533119
2002-12-19
2014-11-26
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: Characteristics of silicon nanocrystal floating gate memory using amorphous carbon/SiO2 tunnel barrier
http://aip.metastore.ingenta.com/content/aip/journal/apl/81/27/10.1063/1.1533119
10.1063/1.1533119
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