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High-selectivity etching of polycrystalline 3C-SiC films using HBr-based transformer coupled plasma
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10.1063/1.1560561
/content/aip/journal/apl/82/11/10.1063/1.1560561
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/11/10.1063/1.1560561
/content/aip/journal/apl/82/11/10.1063/1.1560561
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/content/aip/journal/apl/82/11/10.1063/1.1560561
2003-03-10
2014-10-02
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752b84549af89a08dbdd7fdb8b9568b5 journal.articlezxybnytfddd
Scitation: High-selectivity etching of polycrystalline 3C-SiC films using HBr-based transformer coupled plasma
http://aip.metastore.ingenta.com/content/aip/journal/apl/82/11/10.1063/1.1560561
10.1063/1.1560561
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